Heard on the Beat
Semiconductor Business News
(05/18/03 05:43 p.m. EST)
SiLK + Coral=?
Is it low-k or no-k? IBM Corp.'s Microelectronics Division is considering a plan to drop Dow Chemical Co.'s low-k dielectric solution, dubbed SiLK. IBM tried to deploy Dow's spin-on material at the 130-nm node--with little or no success (see April 21 story ).
Instead, IBM has moved back to fluorinated silicate glass (FSG) as the dielectric material at 130-nm. But word on the street is that IBM is not giving up on Dow's SiLK--yet.
At 90-nm, IBM reportedly plans to take several paths. The company will continue to use FSG at that node, according to sources. At the same time, it will also attempt to deploy a hybrid low-k solution, based on SiLK and Novellus Systems Inc.'s Coral low-k material, which is built around a CVD process, according to sources.
Lesz ebbol vegre vmi? En kezdem elvesziteni a fonalat... a problema lenyegere emlekszem (gebasz a valtozo tulajdonsagok miatti noise, ha jol tevedek), de ez tenyleg ENNYIRE bonyolult megoldani, hogy egy-masfel eve senkinek nem sikerul? :confused: Meg egy olyan R&D nagyagyunak sem, mint az IBM?
[ 2003. december 05.: T2k szerkesztette a hozzászólást ]

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